题目：Preparation and Characterization of Nanostructured Metal Oxide Thin Films

报告人：毛伟博士（日本东京大学助理教授）

时间：2017年6月28日 上午9:00

地点：动力与机械学院报告厅

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摘要:

Interest in growth of metal oxide (MX) thin films has been stimulated by a variety of technical applications such as optical and electrical devices, catalysis, gas sensing, hydrogen permeation barriers, fuel cells and solar energy conversion. One of representative MX (Er2O3) thin films has been first prepared using Si (100) substrates by ion beam sputter deposition at 700oC at a pressure of